MSE Seminar: Gregory Denbeaux (Albany)

Bio: Gregory Denbeaux is an associate professor in the Department of Nanoscale Science & Engineering at the University at Albany. He received his M.A. and Ph.D. degrees in physics from Duke University and his B.A. in physics from Wesleyan University.

His research focuses on lithography and related processes. Part of his research program focuses on the fundamentals of photoresists for extreme ultraviolet (EUV) lithography with an emphasis on the interactions of electrons within the exposure. In an EUV exposure, the primary chemical reaction is due to high energy photon absorption generating a primary electron and a hole (positive charge). The primary electron has some range and during its motion through the resist it can also generate secondary electrons and more holes. The understanding of how many electrons are generated, how far they travel, and which energies of the electrons cause the desired reaction in the photoresist is a major focus of his research.

As part of this research program, typical experiments involve exposures (EUV photons or primary electrons with energies from 5-5000 eV) and reactions are monitored based on outgassing products or other acid detection mechanisms.

Another focus area of his research is on the detection and identification of nanoparticles with an emphasis on how the particles can be generated, transport, and eventually adhere to critical surfaces like masks or wafers in semiconductor manufacturing. That research effort includes particle detection in aerosol, in liquids, and in vacuum systems.